Semiconductor device formed in semiconductor layer arranged on substrate with one of insulating film and cavity interposed between the substrate and the semiconductor layer

ABSTRACT

A semiconductor device according to an aspect of the present invention comprises a first semiconductor layer and a plurality of second semiconductor layers. The first semiconductor layer is formed in a first region of a semiconductor substrate with one of an insulating film and a cavity interposed between the semiconductor substrate and the first semiconductor layer. The plurality of second semiconductor layers is formed in second regions of the semiconductor substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of priority fromthe prior Japanese Patent Application No. 2001-398184, filed Dec. 27,2001, the entire contents of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor device having an SOI(Silicon On Insulator) structure in which a semiconductor layer isformed in a partial region of a semiconductor substrate with aninsulating film interposed between the semiconductor substrate and thesemiconductor layer, or an SON (Silicon On Nothing) structure in which asemiconductor layer is formed in a partial region of a semiconductorsubstrate with a cavity region interposed between the semiconductorsubstrate and the semiconductor layer.

2. Description of the Related Art

Recently, a substrate (to be referred to as an SOI substratehereinafter) having an SOI structure is considered to be promising as asubstrate capable of forming an element which can improve the operatingspeed and reduce the power consumption. This SOI substrate isparticularly attracting attention as a substrate for a logic devicerequired to operate at high speed. On the other hand, when a memoryelement such as a DRAM or an analog circuit such as a power amplifier isformed on the SOI, the element or circuit malfunctions owing to thefloating effect. Accordingly, a DRAM or an analog circuit must be formednot on the SOI but on common silicon in order to stabilize the operationof the memory or circuit.

To form both a logic device and a memory device on a substrate,therefore, it is possible to use a partial SOI substrate in which asilicon region not having the SOI structure and an SOI region having theSOI structure are partially formed on a substrate beforehand. It isnecessary to form a logic circuit on the SOI region in which a buriedoxide film is present below silicon, and to form a DRAM and an analogcircuit on the common silicon region in which no buried oxide film ispresent below silicon.

Unfortunately, analog elements forming the analog circuit are readilyinfluenced by noise, so these elements are preferably electricallydisconnected from the logic circuit and the memory circuit. On thepartial SOI substrate, the logic circuit is formed on the SOI region andsubjected to element isolation. Therefore, this logic circuit and theanalog circuit are electrically disconnected. However, the DRAM and theanalog circuit formed on the same silicon region are formed adjacent toeach other, so noise propagation from the DRAM to the analog circuit isa problem.

Also, when an input/output circuit for exchanging signals with anothersemiconductor device is formed on the SOI region, high voltages areapplied to elements forming this input/output circuit because the SOIregion is insulated. This easily brings about electrostatic breakdown.In addition, the side surfaces of a semiconductor layer in the SOIregion are covered with SiO₂ for element isolation, and the bottomsurface of this semiconductor layer is covered with SiO₂ of the buriedoxide film. Hence, an element formed on the SOI region has the drawbackthat heat generated from this element when the element is driven is notefficiently dissipated.

Furthermore, with the advancing micropatterning of elements, junctionsmust be made shallow. When annealing is performed to activate animpurity such as boron (B), phosphorus (P), or arsenic (As)ion-implanted into a semiconductor layer, the impurity diffuses morethan necessary if the annealing time is long, and this deepens thejunction. To prevent the formation of a deep junction, the semiconductorlayer must be heated and cooled rapidly. A halogen lamp or the like isgenerally used in this heating. However, a difference between the heatabsorption efficiencies between the SOI region and the silicon regionproduces a temperature difference between these regions. Thistemperature difference may form crystal defects such as slips in thesubstrate.

BRIEF SUMMARY OF THE INVENTION

A semiconductor device according to an aspect of the present inventioncomprises a first semiconductor layer formed in a first region of asemiconductor substrate with an insulating film interposed between thesemiconductor substrate and the first semiconductor layer, and aplurality of second semiconductor layers formed in second regions of thesemiconductor substrate.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING

FIG. 1 is a top view showing the arrangement of a semiconductor deviceaccording to the first embodiment of the present invention;

FIG. 2 is a top view of a wafer before the semiconductor device shown inFIG. 1 is diced;

FIG. 3 is a top view showing the arrangement of a semiconductor deviceaccording to the second embodiment of the present invention;

FIG. 4 is a top view of a wafer before the semiconductor device shown inFIG. 3 is diced;

FIG. 5 is a top view showing the arrangement of a semiconductor deviceof the first modification according to the second embodiment;

FIG. 6 is a top view showing the arrangement of a semiconductor deviceof the second modification according to the second embodiment;

FIG. 7 is a top view showing the arrangement of a semiconductor deviceaccording to the third embodiment of the present invention;

FIG. 8 is a top view showing the arrangement of a semiconductor deviceof the first modification according to the third embodiment;

FIG. 9 is a top view showing the arrangement of a semiconductor deviceof the second modification according to the third embodiment;

FIG. 10 is a top view showing the arrangement of a semiconductor deviceaccording to the fourth embodiment of the present invention;

FIG. 11 is a graph showing the dependence of the number of nuclei on theflow rate of hydrochloric acid and on the epitaxial growth temperaturein the semiconductor device of the fourth embodiment;

FIG. 12 is a graph showing the dependence of the number of nuclei on thesize of an SOI region when selectivity is low in the semiconductordevice of the fourth embodiment;

FIG. 13 is a graph showing the dependence of the number of nuclei on theshape of an SOI region in the semiconductor device of the fourthembodiment;

FIG. 14 is a sectional view schematically showing the sections of an SOIregion and a silicon region in the semiconductor device of the fourthembodiment; FIG. 15 is a top view showing the arrangement of asemiconductor device according to the fifth embodiment of the presentinvention;

FIG. 16 is a sectional view showing the structure of a semiconductordevice according to the sixth embodiment of the present invention; and

FIG. 17 is a sectional view showing the structure of a semiconductordevice according to the seventh embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

Embodiments of the present invention will be described in detail belowwith reference to the accompanying drawings. In the followingexplanation, the same reference numerals denote the same partsthroughout the views.

First Embodiment

A semiconductor device according to the first embodiment of the presentinvention will be described below. In this first embodiment, an SOIregion is formed on a main surface of a semiconductor chip, and aplurality of island-like silicon regions are formed in this SOI region.

FIG. 1 is a top view showing the arrangement of the semiconductor deviceof the first embodiment.

As shown in FIG. 1, an SOI region 12 and four silicon regions 13 areformed on a semiconductor chip 11. The SOI region 12 is formed on a mainsurface of the semiconductor chip 11. This SOI region 12 has a sectionalstructure in which a semiconductor layer is formed on an insulating filmon a semiconductor substrate. This semiconductor layer is, e.g., asilicon film.

The silicon regions 13 are a plurality of isolated islands surrounded bythe SOI region 12. Referring to FIG. 1, the four silicon regions 13having a predetermined size or smaller are formed in the SOI region 12.However, a plurality of other silicon regions can also be formed. Thepredetermined size and number of the silicon regions 13 are so set thatno crystal defects such as slips are produced in the semiconductor chip11 by annealing.

Analog circuits such as a digital/analog converter (A/D converter) andamplifier circuit are formed in one of the four silicon regions 13. Inthe remaining three silicon regions 13, semiconductor storage circuits,e.g., 8-Mbit DRAMs are formed. A logic circuit is formed in the SOIregion 12.

In the semiconductor chip having this configuration, the plurality ofsilicon regions 13 are formed in the SOI region 12 on the semiconductorchip 11. Since the size of the individual silicon regions 13 can bedecreased compared to a case in which one silicon region is formed,thermal stress produced in these silicon regions 13 when annealing isperformed can be alleviated. This can reduce crystal defects such asslips produced in the semiconductor chip 11 in the annealing step.

Also, these silicon regions 13 are arranged to be symmetrical withrespect to a certain straight line on the semiconductor chip 11.Preferably, the silicon regions 13 are arranged to be symmetrical withrespect to a certain point on the semiconductor chip 11. Accordingly,thermal stress produced in these silicon regions 13 upon annealing canbe appropriately dispersed on the semiconductor chip 11. This can reducecrystal defects such as slips produced in the semiconductor chip 11 inthe annealing step.

Since the logic circuit is formed in the SOI region 12, the parasiticcapacitance of wiring can be reduced. This facilitates increasing theoperating speed of this logic circuit. Furthermore, the analog circuitsare formed in the silicon region 13 isolated by the SOI region 12. Thiscan prevent the propagation of noise from the logic circuit and theDRAMs to the analog circuits.

FIG. 2 is a top view of a wafer before the semiconductor chip 11 shownin FIG. 1 is diced.

As shown in FIG. 2, an SOI region 12 is formed on the wafer(semiconductor substrate). In this SOI region 12, a plurality of siliconregions 13 having a predetermined size are arranged. The predeterminedsize and number of these silicon regions 13 are so set that no crystaldefects such as slips are produced in the wafer by annealing. Thesemiconductor chip 11 shown in FIG. 1 is cut from the broken lines shownin FIG. 2.

Next, a method of fabricating the semiconductor device according to thefirst embodiment will be described.

First, two silicon wafers having 200-mmφ mirror surfaces are prepared.On the first wafer, a 100-nm thick oxide film is formed in a dry oxygenatmosphere. After that, this surface of the first wafer on which theoxide film is formed and the mirror surface of the second wafer areadhered, and the two wafers are bonded by annealing at 1,100° C.

Subsequently, one side of the bonded substrate is polished to reduce thethickness of a silicon film present on the oxide film to 100 nm. Aphotoresist film is formed on this silicon film, and a desired patternis transferred onto the photoresist film by using an exposure mask. Theresist film present on the internal oxide film to be removed in thelater step is stripped, thereby forming a resist pattern. After that, anaqueous solution of potassium hydroxide (KOH) is used to etch thesilicon film not covered with the resist pattern. In addition, theburied oxide film is removed by an aqueous solution of hydrogen fluoride(HF).

Next, selective epitaxial growth is performed to form a siliconepitaxial layer on the silicon film exposed by the removal of the oxidefilm. If necessary, the surface of this silicon epitaxial layer ispolished by CMP.

By the above-mentioned fabrication method, a wafer on which 6 mm×6 mmsilicon regions 13 were arranged at 10-mm pitches in the longitudinaland lateral directions in an SOI region 12 was formed as a practicalexample of this first embodiment. This wafer was cut to form a 20 mm×20mm semiconductor chip. On this semiconductor chip, four 6 mm×6 mmsilicon regions 13 were arranged. An A/D converter and an amplifiercircuit were formed in one silicon region 13, and 8-Mbit DRAMs wereformed in the three other silicon regions 13.

As a comparative example of this first embodiment, a wafer on which 12mm×12 mm silicon regions were arranged at 20-mm pitches in thelongitudinal and lateral directions in an SOI region 12 was formed. Thiswafer was cut to form a 20 mm×20 mm semi-conductor chip. On thissemiconductor chip, one 12 mm×12 mm silicon region was formed. An A/Dconverter, amplifier circuit, and 8-Mbit DRAM were formed in thissilicon region.

The characteristics of the semiconductor chip 11 having the four siliconchips (6 mm×6 mm) were compared with the characteristics of asemiconductor chip 11A having one silicon region (12 mm×12 mm), and theresults were as follows. The S/N ratio of the semiconductor chip 11 was30 dB, and that of the semiconductor chip 11A was 15 dB. That is, thischaracteristic of the semiconductor chip 11A was deteriorated by noisepresumably produced by the formation of the A/D converter, amplifiercircuit, and DRAM in one silicon region. Also, the leakage currentcharacteristic of the semiconductor chip 11 was not deteriorated.However, the leakage current characteristic of the semiconductor chip11A was deteriorated by slips probably produced in the annealing step(RTA step) in the element formation process.

Note that in the first embodiment, an SON region having the SONstructure may be formed instead of the SOI region described earlier.Even when this SON region is formed, the same effects as when the SOIregion is formed can be obtained. The SON region will be described indetail later in the seventh embodiment.

In this first embodiment as described above, even when a substrate israpidly heated and cooled, it is possible to reduce the influence of atemperature difference produced by a difference between the heatabsorption efficiencies of an SOI region or SON region and a siliconregion on the substrate. This can prevent the generation of crystaldefects in the substrate.

Second Embodiment

A semiconductor device according to the second embodiment of the presentinvention will be described below. In this second embodiment, an SOIregion is formed on a main surface of a semiconductor chip, and aplurality of island-like silicon regions are formed to be surrounded bythis SOI region. In addition, a silicon region is formed on anouterperipheral of the semiconductor chip.

FIG. 3 is a top view showing the arrangement of the semiconductor deviceof the second embodiment.

As shown in FIG. 3, an SOI region 22 and two silicon regions 23A and 23Bare formed on a semiconductor chip 21. The silicon region 23A is formedto have a predetermined width on an outerperipheral of the semiconductorchip 21, so as to surround the SOI region 22. The silicon region 23B isan isolated island surrounded by the SOI region 22 and has apredetermined size or smaller. The predetermined width of the siliconregion 23A and the predetermined size of the silicon region 23B are soset that no crystal defects such as slips are produced in thesemiconductor chip 21 by annealing. The SOI region 22 has a sectionalstructure in which a semiconductor layer is formed on an insulating filmon a semi-conductor substrate. This semiconductor layer is, e.g., asilicon film.

In the silicon region 23A, an input/output circuit (I/O circuit) forexchanging signals with the outside is formed. In the silicon region23B, a semiconductor storage circuit, e.g., an 8-Mbit DRAM is formed. Alogic circuit is formed in the SOI region 22.

In the semiconductor chip having this configuration, the silicon region23A is formed on the outerperipheral of the semiconductor chip 21, andthe silicon region 23B is formed in the SOI region 22 surrounded by thesilicon region 23A. Since the sizes of these silicon regions 23A and 23Bcan be decreased compared to a case in which one silicon region isformed, thermal stress produced in the silicon regions 23A and 23B whenannealing is performed can be alleviated. This can reduce crystaldefects such as slips produced in the semiconductor chip 21 in theannealing step.

Also, the logic circuit is formed in the SOI region 22, so the parasiticcapacitance of wiring can be reduced. This facilitates increasing theoperating speed of this logic circuit. Furthermore, since the I/Ocircuit is formed in the silicon region 23A, it is possible to preventthe application of high voltages to elements forming this I/O circuit.This can prevent electrostatic breakdown.

FIG. 4 is a top view of a wafer before the semiconductor chip 21 shownin FIG. 3 is diced.

As shown in FIG. 4, SOI regions 22 is formed on the wafer (semiconductorsubstrate). In the SOI regions 22, a plurality of silicon regions 23Bhaving a predetermined size are arranged. In addition, a silicon region23A having a predetermined width is linearly formed to segment the SOIregions 22 in the longitudinal and lateral directions. The predeterminedwidth of the silicon region 23A and the predetermined size of thesilicon regions 23B are so set that no crystal defects such as slips areproduced in the wafer by annealing. The semiconductor chip 21 shown inFIG. 3 is cut from the broken lines shown in FIG. 4.

As described above, the plurality of silicon regions 23B are formed inthe SOI regions 22 on the wafer, and the linear silicon region 23A isformed to segment the SOI regions 22. Since the sizes of the individualsilicon regions 23A and 23B can be decreased, thermal stress producedduring annealing can be alleviated. This can reduce crystal defects suchas slips produced in the wafer in the annealing step.

Note that a method of fabricating the semiconductor device according tothe second embodiment is the same as the first embodiment describedabove, so a detailed explanation thereof will be omitted.

Next, semiconductor devices of modifications according to the secondembodiment will be described.

FIG. 5 is a top view showing the arrangement of a semiconductor deviceof the first modification according to the second embodiment.

As shown in FIG. 5, an SOI region 22, a silicon region 23A, and twosilicon regions 23B are formed on a semiconductor chip 21. The siliconregion 23A is formed to have a predetermined width on an outerperipheralof the semiconductor chip 21, so as to surround the SOI region 22. Thetwo silicon regions 23B are isolated islands surrounded by the SOIregion 22 and have a predetermined size or smaller. The predeterminedwidth of the silicon region 23A and the predetermined size of thesilicon regions 23B are so set that no crystal defects such as slips areproduced in the semiconductor chip 21 by annealing. The SOI region 22has a sectional structure in which a semiconductor layer is formed on aninsulating film on a semiconductor substrate. This semiconductor layeris, e.g., a silicon film.

In the silicon region 23A, an input/output circuit (I/O circuit) forexchanging signals with the outside is formed. Of the two siliconregions 23B, analog circuits, e.g., a digital/analog converter (A/Dconverter) and an amplifier circuit are formed in one silicon region23B. In the other silicon region 23B, a semiconductor storage circuit,e.g., an 8-Mbit DRAM is formed. A logic circuit is formed in the SOIregion 22.

In the semiconductor chip having this configuration, the silicon region23A is formed on the outerperipheral of the semiconductor chip 21, andthe two silicon regions 23B are formed in the SOI region 22 surroundedby the silicon region 23A. Since the sizes of the individual siliconregions 23A and 23B can be decreased compared to a case in which onesilicon region is formed, thermal stress produced in these siliconregions 23A and 23B when annealing is performed can be alleviated. Thiscan reduce crystal defects such as slips produced in the semiconductorchip 21 in the annealing step.

Also, the logic circuit is formed in the SOI region 22, so the parasiticcapacitance of wiring can be reduced. This facilitates increasing theoperating speed of this logic circuit. Furthermore, of the two siliconregions 23B isolated by the SOI region 22, the analog circuits areformed in one silicon region 23B, and the DRAM is formed in the othersilicon region 23B. This can prevent the propagation of noise from thelogic circuit and the DRAM to the analog circuits.

Note that in this modification, the two silicon regions 23B are formed.However, a plurality of other silicon regions can also be formed.

FIG. 6 is a top view showing the arrangement of a semiconductor deviceof the second modification according to the second embodiment.

As shown in FIG. 6, an SOI region 22, a silicon region 23A, and foursilicon regions 23B are formed on a semiconductor chip 21. The siliconregion 23A is formed to have a predetermined width on an outerperipheralof the semiconductor chip 21, so as to surround the SOI region 22. Thefour silicon regions 23B are isolated islands surrounded by the SOIregion 22 and have a predetermined size or smaller. The predeterminedwidth of the silicon region 23A and the predetermined size of thesilicon regions 23B are so set that no crystal defects such as slips areproduced in the semiconductor chip 21 by annealing. The SOI region 22has a sectional structure in which a semiconductor layer is formed on aninsulating film on a semiconductor substrate. This semiconductor layeris, e.g., a silicon film.

In the silicon region 23A, an input/output circuit (I/O circuit) forexchanging signals with the outside is formed. Of the four siliconregions 23B, analog circuits, e.g., a digital/analog converter (A/Dconverter) and an amplifier circuit are formed in one silicon region23B. In the three other silicon regions 23B, semiconductor storagecircuits, e.g., 8-Mbit DRAMs are formed. A logic circuit is formed inthe SOI region 22.

In the semiconductor chip having this configuration, the silicon region23A is formed on the outerperipheral of the semiconductor chip 21, andthe four silicon regions 23B are formed in the SOI region 22 surroundedby the silicon region 23A. Since the sizes of the individual siliconregions 23A and 23B can be decreased compared to a case in which onesilicon region is formed, thermal stress produced in these siliconregions 23A and 23B when annealing is performed can be alleviated. Thiscan reduce crystal defects such as slips produced in the semiconductorchip 21 in the annealing step.

Also, the logic circuit is formed in the SOI region 22, so the parasiticcapacitance of wiring can be reduced. This facilitates increasing theoperating speed of this logic circuit. Furthermore, of the four siliconregions 23B isolated by the SOI region 22, the analog circuits areformed in one silicon region 23B, and the DRAMs are formed in the threeother silicon regions 23B. This can prevent the propagation of noisefrom the logic circuit and the DRAMs to the analog circuits.

Note that in this modification, the four silicon regions 23B are formed.However, a plurality of other silicon regions can also be formed.

In the second embodiment and its modification, an SON region having theSON structure may be formed instead of the SOI region described earlier.Even when this SON region is formed, the same effects as when the SOIregion is formed can be obtained.

In this second embodiment and its modifications as described above, evenwhen a substrate is rapidly heated and cooled, it is possible to reducethe influence of a temperature difference produced by a differencebetween the heat absorption efficiencies of an SOI region or SON regionand a silicon region on the substrate. This can prevent the generationof crystal defects in the substrate.

Third Embodiment

A semiconductor device according to the third embodiment of the presentinvention will be described below. In this third embodiment, a siliconregion is formed on a main surface of a semiconductor chip, andisland-like SOI regions are formed to be surrounded by this siliconregion.

FIG. 7 is a top view showing the arrangement of the semiconductor deviceof the third embodiment.

As shown in FIG. 7, four SOI regions 32 and a silicon region 33 areformed on a semiconductor chip 31. The silicon region 33 is formed on amain surface of the semiconductor chip 31. The SOI regions 32 are aplurality of isolated islands surrounded by the silicon region 33.Referring to FIG. 7, the four SOI regions 32 having a predetermined sizeor smaller are arranged in the silicon region 33. However, a pluralityof other SOI regions can also be formed. The predetermined size of theSOI regions 32 is so set that no crystal defects such as slips areproduced in the semiconductor chip 31 by annealing. Each SOI region 32has a sectional structure in which a semiconductor layer is formed on aninsulating film on a semiconductor substrate. This semiconductor layeris, e.g., a silicon film.

A semiconductor storage circuit, e.g., an 8-Mbit DRAM, an analogcircuit, and a signal input/output circuit are formed in the siliconregion 33. Logic circuits are formed in the four SOI regions 32.

In the semiconductor chip having this configuration, the plurality ofSOI regions 32 are formed in the silicon region 33 on the semiconductorchip 31. Since the size of the individual SOI regions 32 can bedecreased compared to a case in which one SOI region is formed, thermalstress produced in these SOI regions 32 when annealing is performed canbe alleviated. This can reduce crystal defects such as slips produced inthe semiconductor chip 31 in the annealing step.

Also, these SOI regions 32 are arranged to be symmetrical with respectto a certain straight line on the semiconductor chip 31. Preferably, theSOI regions 32 are arranged to be symmetrical with respect to a certainpoint on the semiconductor chip 31. Accordingly, thermal stress producedin these SOI regions 32 upon annealing can be appropriately dispersed onthe semiconductor chip 31. This can reduce crystal defects such as slipsproduced in the semiconductor chip 31 in the annealing step.

Since the logic circuits are formed in the SOI regions 32, the parasiticcapacitance of wiring can be reduced. This facilitates increasing theoperating speed of these logic circuits.

Next, semiconductor devices according to modifications of this thirdembodiment will be described.

FIG. 8 is a top view showing the arrangement of a semiconductor deviceaccording to the first modification of the third embodiment.

As shown in FIG. 8, two SOI regions 32 and a silicon region 33 areformed on a semiconductor chip 31. The SOI regions 32 are a plurality ofisolated islands surrounded by the silicon region 33. Referring to FIG.8, the two SOI regions 32 having a predetermined size or smaller arearranged in the silicon region 33. The predetermined size of these SOIregions 32 is so set that no crystal defects such as slips are producedin the semiconductor chip 31 by annealing. Each SOI region 32 has asectional structure in which a semiconductor layer is formed on aninsulating film on a semiconductor substrate. This semiconductor layeris, e.g., a silicon film.

A semiconductor storage circuit, e.g., an 8-Mbit DRAM is formed in thesilicon region 33. Logic circuits are formed in the two SOI regions 32.

In the semiconductor chip having this configuration, similar to theabove-mentioned semiconductor chip, the plurality of SOI regions 32 areformed in the silicon region 33 on the semiconductor chip 31. Since thesize of the individual SOI regions 32 can be decreased compared to acase in which one SOI region is formed, thermal stress produced in theseSOI regions 32 when annealing is performed can be alleviated. This canreduce crystal defects such as slips produced in the semiconductor chip31 in the annealing step.

Also, since the logic circuits are formed in the SOI regions 32, theparasitic capacitance of wiring can be reduced. This facilitatesincreasing the operating speed of these logic circuits.

FIG. 9 is a top view showing the arrangement of a semiconductor deviceaccording to the second modification of the third embodiment.

As shown in FIG. 9, an SOI region 32 and silicon regions 33 and 33A areformed on a semiconductor chip 31. The SOI region 32 is an isolatedisland surrounded by the silicon regions 33 and 33A and has apredetermined size or smaller. The predetermined size of this SOI region32 is so set that no crystal defects such as slips are produced in thesemiconductor chip 31 by annealing. This SOI region 32 has a sectionalstructure in which a semiconductor layer is formed on an insulating filmon a semiconductor substrate. This semiconductor layer is, e.g., asilicon film.

The silicon region 33 is formed to have a predetermined width on anouterperipheral of the semiconductor chip 31. The silicon region 33A isformed between a corner of the SOI region 32 and the silicon region 33.

An input/output circuit for exchanging signals with the outside isformed in the silicon region 33. A semiconductor storage circuit, e.g.,an 8-Mbit DRAM is formed in the silicon region 33A. A logic circuit isformed in the SOI region 32.

In the semiconductor chip having this configuration, the silicon regions33 and 33A are formed on the outerperipheral of the semiconductor chip31, and the SOI region 32 having a predetermined size is formed in aregion surrounded by the silicon regions 33 and 33A. Accordingly,thermal stress produced when annealing is performed can be alleviated.This can reduce crystal defects such as slips produced in thesemiconductor chip 31 in the annealing step.

Also, since the logic circuit is formed in the SOI region 32, theparasitic capacitance of wiring can be reduced. This facilitatesincreasing the operating speed of this logic circuit.

Note that in the third embodiment and its modification, an SON regionhaving the SON structure may be formed instead of the SOI regiondescribed earlier. Even when this SON region is formed, the same effectsas when the SOI region is formed can be obtained.

In this third embodiment and its modifications as described above, evenwhen a substrate is rapidly heated and cooled, it is possible to reducethe influence of a temperature difference produced by a differencebetween the heat absorption efficiencies of an SOI region or SON regionand a silicon region on the substrate. This can prevent the generationof crystal defects in the substrate.

Fourth Embodiment

A semiconductor device according to the fourth embodiment of the presentinvention will be described below. In this fourth embodiment, a siliconregion is formed on a main surface of a semiconductor chip, and aplurality of island-like SOI regions are formed to be surrounded by thissilicon region. In addition, a method of solving the problem ofselection breakdown by which, in a selective epitaxial growth step forforming a silicon region, silicon is deposited on an SOI region otherthan the silicon region will be explained.

FIG. 10 is a top view showing the arrangement of the semiconductordevice of the fourth embodiment.

As shown in FIG. 10, four isolated SOI regions 42 and a silicon region43 are formed on a semiconductor chip 41. The silicon region 43 isformed on a main surface of the semiconductor chip 41. The SOI regions42 are a plurality of isolated islands surrounded by the silicon region43. Referring to FIG. 10, the four SOI regions 42 having a predeterminedsize or smaller are arranged in the silicon region 43. However, aplurality of other SOI regions can also be formed. The predeterminedsize of these SOI regions 42 is so set that no crystal defects such asslips are produced in the semiconductor chip 41 by annealing. Each SOIregion 42 has a sectional structure in which a semiconductor layer isformed on an insulating film on a semiconductor substrate. Thissemiconductor layer is, e.g., a silicon film.

In the semiconductor chip 41 having this configuration, the plurality ofisland-like SOI regions 42 are formed in the silicon region 43 on thesemiconductor chip 41. Since the size of the individual SOI regions 42can be decreased compared to a case in which one SOI region is formed,thermal stress produced in these SOI regions 42 when annealing isperformed can be alleviated. This can reduce crystal defects such asslips produced in the semiconductor chip 41 in the annealing step.

When the SOI regions and the silicon region are to be formed on thesemiconductor chip, selective epitaxial growth is used in the formationof the silicon region. When this selective epitaxial growth method isused, the problem of selection breakdown arises by which silicon isdeposited on an insulating film, such as an oxide film or nitride film,on the SOI regions. A semiconductor device which has solved this problemof selection breakdown will be explained below. A fabrication methodusing selective epitaxial growth will be described first, and then amethod of preventing selection breakdown will be explained.

First, a native oxide film present on the surface of a silicon substrateis removed by pre-processing using an aqueous solution of hydrogenfluoride. After that, the wafer is loaded into an epitaxial growthapparatus. Annealing is performed in a non-oxidizing atmosphere, e.g., ahydrogen atmosphere. This annealing is for cleaning the siliconsubstrate surface before epitaxial growth, and the silicon oxide film onthe substrate surface is completely removed in this stage. Accordingly,this annealing is desirably performed in a non-oxidizing atmosphere suchas a hydrogen atmosphere. The annealing conditions are, e.g., 1,000° C.,10 Torr, and 3 min.

Subsequently, silicon epitaxial growth is performed. SiH₂Cl₂(DCS) andHCl/H₂ are used as a growth gas/a carrier gas. When a silicon oxide filmor a silicon nitride film is patterned on the silicon substrate, anepitaxial silicon film can be selectively formed only on the siliconsubstrate by the use of DCS and HCl. This epitaxial growth is performedat a temperature of 90° C. or more.

The results of examination of selection breakdown when theaforementioned selective epitaxial growth was performed will bedescribed below.

FIGS. 11, 12, and 13 are graphs obtained by monitoring the number ofsilicon nuclei produced on an SOI region after epitaxial growth. Theordinate indicates the number of silicon nuclei: the larger the numberof silicon nuclei, the larger the selection breakdown. Note that thesurface of the SOI region is a silicon oxide film or a silicon nitridefilm.

Generally, selective epitaxial growth can be performed on both a siliconoxide film and a silicon nitride film. As to selectivity, however,selection breakdown occurs more easily when a silicon nitride film isused. Therefore, the experiments were conducted under severer conditionsusing a silicon nitride film.

First, the selectivity was evaluated with respect to a main surface of awafer covered with a silicon nitride film. FIG. 11 shows the dependenceof the number of silicon nuclei on the flow rate of hydrochloric acid.FIG. 11 indicates that the smaller the hydrochloric acid flow rate, themore largely the selectivity suffers.

FIG. 12 shows the dependence of the number of silicon nuclei on the sizeof an SOI region when the selectivity was low. FIG. 12 demonstrates thata given selectivity can be assured (does not break down) when the areaof an isolated SOI region is small. Note that the shape of this SOIregion was a square.

FIG. 13 shows the dependence of the number of silicon nuclei on theshape of an SOI region. The shape of the SOI region was a rectangle, andits area was fixed. FIG. 13 shows a change in the number of siliconnuclei when the length of the short side of this rectangle was changed.FIG. 13 reveals that even when the area of the SOI region is fixed, agiven selectivity can be ensured by decreasing the length of the shortside of the rectangle. That is, a desired selectivity can be ensured fora large SOI area by shortening the side of the SOI region. When thelength of the short side of a rectangular SOI region is 10 mm or less,the number of silicon nuclei is equal to or smaller than the permissiblenumber. By taking this into account, consider a square SOI region of 10mm side. The distance from the center (the intersection of diagonallines) to the edge of the SOI region is 5 mm. Accordingly, if at least aportion of a silicon region formed by epitaxial growth is within therange of a radius of 5 mm from a certain point on the SOI region, dropin selectivity in selective epitaxial growth can be suppressed.

This phenomenon in which drop in selectivity in selective epitaxialgrowth can be suppressed is presumably brought about by the followingreason. FIG. 14 is a view schematically showing the sections of the SOIregion 42 and the silicon region 43 in the semiconductor chip 41.

As shown in FIG. 14, a silicon film 46 is formed on a silicon substrate44 with an insulating film 45 interposed between the silicon substrate44 and the silicon film 46. On the silicon film 46, a silicon nitridefilm 47 having a hole 47A is formed. In the hole 47A of the siliconnitride film 47, silicon 48 currently being epitaxially grown isdeposited on the silicon substrate 44.

In this state shown in FIG. 14, a silicon nucleus 49A deposited on thesilicon nitride film 47 (on the SOI region) by selective epitaxialgrowth moves to the hole (silicon region) 47A and is absorbed by thesilicon 48, if the distance from the hole 47A is equal to or smallerthan a predetermined distance X. On the other hand, a silicon nucleus49B at a distance Y longer than X from the hole 47A is hardly absorbedby the silicon 48, even when the silicon nucleus 49B moves toward thehole 47A, because the distance from the hole 47A is long. So, thesilicon nucleus 49B stays and grows on the silicon nitride film 47. Poorselectivity is caused by the silicon nucleus 49B.

In the fourth embodiment as described above, even when a substrate israpidly heated and cooled, it is possible to reduce the influence of atemperature difference produced by a difference between the heatabsorption efficiencies of an SOI region and a silicon region on thesubstrate. This can prevent the generation of crystal defects in thesubstrate.

In addition, drop in selectivity of selective epitaxial growth can besuppressed by forming at least a portion of an epitaxial silicon regionwithin the predetermined distance X (5 mm) from a certain point on theSOI region.

Note that in this embodiment, a plurality of SOI regions are formed.However, even when one SOI region is formed, drop in selectivity ofselective epitaxial growth can be suppressed by forming at least aportion of an epitaxial silicon region within the predetermined distanceX (5 mm) from any point on the SOI region.

In the fourth embodiment, an SON region having the SON structure may beformed instead of the SOI region described earlier. Even when this SONregion is formed, the same effects as when the SOI region is formed canbe obtained.

Fifth Embodiment

A semiconductor device according to the fifth embodiment of the presentinvention will be described below. In this fifth embodiment, an SOIregion is formed on a main surface of a semiconductor chip, and aplurality of silicon regions are formed to be surrounded by the SOIregion. In addition, a method of solving the problem of selectionbreakdown by which, in a selective epitaxial growth step for forming asilicon region, silicon is deposited on an SOI region other than thesilicon region will be explained.

FIG. 15 is a top view showing the arrangement of the semiconductordevice of the fifth embodiment.

As shown in FIG. 15, an SOI region 52 and four isolated silicon regions53 are formed on a semiconductor chip 51. The silicon region 52 isformed on a main surface of the semiconductor chip 51. The SOI region 52has a sectional structure in which a semiconductor layer is formed on aninsulating film on a semiconductor substrate. This semiconductor layeris, e.g., a silicon film.

The silicon regions 53 are a plurality of isolated islands surrounded bythe SOI region 52. Referring to FIG. 15, the four silicon regions 53having a predetermined size or smaller are arranged in the SOI region52. However, a plurality of other silicon regions can also be formed.The predetermined size of these silicon regions 53 is so set that nocrystal defects such as slips are produced in the semiconductor chip 51by annealing.

In the semiconductor chip 51 having this configuration, the plurality ofisland-like silicon regions 53 are formed in the SOI region 52 on thesemiconductor chip 51. Since the sizes of the individual silicon regions53 can be decreased compared to a case in which one silicon region isformed, thermal stress produced in these silicon regions 53 whenannealing is performed can be alleviated. This can reduce crystaldefects such as slips produced in the semiconductor chip 51 in theannealing step.

In addition, on the basis of the countermeasure against selectionbreakdown described in the above fourth embodiment, at least a portionof the silicon region 53 is formed within a predetermined distance X (5mm) from a certain point on the SOI region 52. Consequently, a drop inselectivity in selective epitaxial growth can be suppressed.

Note that in this embodiment, a plurality of silicon regions are formed.However, even when one silicon region is formed, a drop in selectivityin selective epitaxial growth can be suppressed by forming at least aportion of an epitaxial silicon region within the predetermined distanceX (5 mm) from any point on the SOI region.

This arrangement for suppressing a drop in selectivity in selectiveepitaxial growth is similarly applicable to any of the first to thirdembodiments described previously.

Note that in the fifth embodiment, an SON region having the SONstructure may be formed instead of the SOI region described earlier.Even when this SON region is formed, the same effects as when the SOIregion is formed can be obtained.

Sixth Embodiment

A semiconductor device of the sixth embodiment of the present inventionwill be described below. In this sixth embodiment, an example in whichelements are respectively formed in the silicon region and the SOIregion in the semiconductor device according to each of the first tofifth embodiments will be explained with reference to a sectional view.

FIG. 16 is a sectional view showing the structure of the semiconductordevice of the sixth embodiment.

As shown in FIG. 16, an SOI structure is formed in a portion of asilicon substrate 60. That is, an insulating layer 61 is formed on oneregion of the silicon substrate 60, and a semiconductor layer 62 isformed on this insulating layer 61. The insulating layer 61 is, e.g., asilicon oxide film and will be referred to as a BOX (Buried Oxide) layerhereinafter. The semiconductor layer 62 is, e.g., a silicon layer andwill be referred to as an SOI layer hereinafter. A semiconductor layer,e.g., a silicon layer 63 is formed on the other region of the siliconsubstrate 60.

As described above, the region in which the SOI structure including theBOX layer 61 and the SOI layer 62 is formed on the silicon substrate 60is an SOI region. The region in which the silicon layer 63 is formed onthe silicon substrate 60 is a silicon region. The SOI region 62 iselectrically isolated from the silicon substrate 60 by the BOX layer 61.The silicon layer 63 is electrically connected to the silicon substrate60.

In these silicon region and SOI region, element regions surrounded byelement isolation regions STI and an element isolation region 64 areformed. Note that the element isolation region 64 in the SOI region andthe element isolation region STI in the boundary between the siliconregion and the SOI region are so formed as to reach at least the BOXlayer 61. Note also that the element isolation region 64 in the SOIregion is formed by, e.g., a well-known LOCOS (Local oxidation ofSilicon) process. The element isolation region STI in the boundarybetween the silicon region and the SOI region and the element isolationregion STI in the silicon region are formed by forming trenches andburying an insulating film in these trenches.

A MOS transistor TR1 is formed in the element region in the siliconregion. A MOS transistor TR2 is formed in the element region in the SOIregion. Each of these MOS transistors TR1 and TR2 has a source region,drain region, and gate electrode. A source region 65A and a drain region66A of the MOS transistor TR1 are formed apart from each other on thesurface of the silicon layer 63. A gate electrode 67A of this MOStransistor TR1 is formed on the silicon layer 63 between the sourceregion 65A and the drain region 66A with a gate insulating film 68Ainterposed between the silicon layer 63 and the gate electrode 67A.

A source region 65B and a drain region 66B of the MOS transistor TR2 areformed apart from each other on the surface of the SOI layer 62. A gateelectrode 67B of this MOS transistor TR2 is formed on the SOI layer 62between the source region 65B and the drain region 66B with a gateinsulating film 68B interposed between the SOI layer 62 and the gateelectrode 67B. The bottom portions of the source region 65B and thedrain region 66B of the MOS transistor TR2 reach the BOX layer 61.

In the semiconductor device of this sixth embodiment, as described inthe first to fifth embodiments, thermal stress produced in the siliconregion and the SOI region can be alleviated. Consequently, crystaldefects such as slips produced in the semiconductor device can bereduced.

Seventh Embodiment

A semiconductor device of the seventh embodiment of the presentinvention will be described below. In this seventh embodiment, asemiconductor device having an SON (Silicon On Nothing) structure willbe explained. In this SON structure, a silicon layer is formed on acavity region. Details of the SON structure will be described later. Inthe above sixth embodiment, an element is formed in the SOI regionhaving the SOI structure. In this seventh embodiment, an element isformed in an SON region having the SON structure, instead of the SOIregion.

FIG. 17 is a sectional view showing the structure of the semiconductordevice of the seventh embodiment.

As shown in FIG. 17, this semiconductor device has a silicon region andan SON region. In these silicon region and SON region, element regionselectrically isolated from each other by element isolation regions STIare formed. In these element regions, MOS transistors TR1 and TR3 areformed.

The structure of the silicon region is the same as in the sixthembodiment, so a detailed description thereof will be omitted. In thisembodiment, only the SON region will be explained.

As shown in FIG. 17, an SON structure is formed in a portion of asilicon substrate 60. That is, a cavity region 71 is formed on a partialregion of this silicon substrate 60. A semiconductor layer 72 is formedon the silicon substrate 60 with this cavity region 71 interposedbetween the silicon substrate 60 and the semiconductor layer 72. Thesemiconductor layer 72 is, e.g., a silicon layer and will be referred toas an SON layer hereinafter. The region in which the SON structureincluding the cavity region 71 and the SON layer 72 is formed on thesilicon substrate 60 is an SON region. The SON layer 72 is electricallyisolated from the silicon substrate 60 by the cavity region 71.Accordingly, it is possible to obtain the same effect as the SOIstructure having the BOX layer 61 between the silicon substrate 60 andthe SOI layer 62 as explained in the sixth embodiment.

In the SON region, an element region surrounded by an element isolationregion STI and an element isolation region 73 is formed. This elementisolation region 73 in the SON region reaches the silicon substrate 60.Note that the element isolation region 73 is formed by fabrication stepsdifferent from fabrication steps of forming an element isolation regionSTI in the silicon region and an element isolation region STI in theboundary between the silicon region and the SON region.

In the element region formed in the SON region, the MOS transistor TR3is formed. This MOS transistor TR3 has a source region, drain region,and gate electrode. A source region 74B and a drain region 75B of theMOS transistor TR3 reach the cavity region 71. A gate electrode 76B ofthis MOS transistor TR3 is formed on the SON layer 72 between the sourceregion 74B and the drain region 75B with a gate insulating film 77Binterposed between the SON layer 72 and the gate electrode 76B. The MOStransistor TR1 formed in the element region in the silicon region hasthe same arrangement as in the sixth embodiment, so a detaileddescription thereof will be omitted.

As described above, even a semiconductor device having an SON structurein a partial region of a silicon substrate can achieve the same effectsas explained in the first to fifth embodiments.

In the semiconductor device of this seventh embodiment, as described inthe sixth embodiment, thermal stress produced in the silicon region andthe SON region can be alleviated. Consequently, crystal defects such asslips produced in the semiconductor device can be reduced. Also, theabove-mentioned embodiments can be practiced singly or in the form of anappropriate combination.

Furthermore, each of the above embodiments includes inventions invarious stages. So, these inventions in various stages can be extractedby properly combining a plurality of components disclosed in eachembodiment.

As described above, each embodiment of the present invention can providea semiconductor device capable of reducing the influence of atemperature difference produced by a difference between the thermalabsorption efficiencies of an SOI region and a silicon region on asubstrate, even when the substrate is rapidly heated and cooled, therebypreventing the generation of crystal defects in the substrate.

Additional advantages and modifications will readily occur to thoseskilled in the art. Therefore, the invention in its broader aspects isnot limited to the specific details and representative embodiments shownand described herein. Accordingly, various modifications may be madewithout departing from the spirit and scope of the general inventiveconcept as defined by the appended claims and their equivalents.

1-24. (canceled)
 25. A semiconductor device comprising: a plurality offirst semiconductor layers formed in a first region of a semiconductorsubstrate with one of an insulating film and a cavity interposed betweensaid semiconductor substrate and said plurality of first semiconductorlayers; and a second semiconductor layer formed in a second region ofsaid semiconductor substrate, wherein at least a portion of said secondsemiconductor layer is formed within the range of a radius of 5 mm froma certain point on said plurality of first semiconductor layers.
 26. Asemiconductor device according to claim 25, wherein logic circuits areformed in said plurality of first semiconductor layers, and at least oneof a storage element, an analog element, and a signal input/outputcircuit is formed in said second semiconductor layer.
 27. Asemiconductor device according to claim 25, wherein said plurality offirst semiconductor layers are arranged to be symmetrical with respectto a certain point on said semiconductor substrate.
 28. A semiconductordevice according to claim 25, wherein said plurality of firstsemiconductor layers are arranged to be symmetrical with respect to acertain straight line on said semiconductor substrate.
 29. Asemiconductor device according to claim 25, wherein the area of saidsecond semiconductor layer is larger than the sum of the areas of saidplurality of first semiconductor layers.
 30. A semiconductor deviceaccording to claim 25, wherein said second semiconductor layer isdeposited by epitaxial growth.
 31. A semiconductor device comprising: afirst semiconductor layer formed on a semiconductor substrate with oneof an insulating film and a cavity interposed between said semiconductorsubstrate and said first semiconductor layer, said first semiconductorlayer being a rectangle; and a second semiconductor layer formed on anouterperipheral of said semiconductor substrate, said secondsemiconductor layer surrounding said first semiconductor layer, saidsecond semiconductor layer being formed such that a corner of therectangular first semiconductor layer has a cutaway shape, wherein atleast a portion of said second semiconductor layer is formed within therange of a radius of 5 mm from any point on said first semiconductorlayer.